The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
Dec. 14, 2004
Neal Callan, Lake Oswego, OR (US);
Nadya Belova, Portland, OR (US);
Neal Callan, Lake Oswego, OR (US);
Nadya Belova, Portland, OR (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
A method for performing post-optical proximity correction (OPC) multi layer overlay quality inspection includes the steps of generating a virtual target mask for a first mask and a second mask overlay using design rules at least partially defining the relationship between the first mask and the second mask; creating a composite aerial image representing a first mask image formed from the first mask and a second mask image formed by the second mask by performing imaging of the first mask and the second mask and overlaying the second mask image onto the first mask image; generating an overlay image map of the composite aerial image using the design rules at least partially defining the relationship between the first mask and the second mask; and comparing the overlay image map area and the virtual target mask area.