The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
Dec. 22, 2004
Joeri Lof, Eindhoven, NL;
Jeroen Fluit, Eindhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Peter Spit, Lantau Island, CN;
Joeri Lof, Eindhoven, NL;
Jeroen Fluit, Eindhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Peter Spit, Lantau Island, CN;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.