The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2008

Filed:

Dec. 02, 2005
Applicants:

Axel Preusse, Radebeul, DE;

Markus Keil, Dresden, DE;

Wolfgang Buchholtz, Radebeul, DE;

Petra Hetzer, Dresden, DE;

Elvira Buchholtz, Radebeul, DE;

Inventors:

Axel Preusse, Radebeul, DE;

Markus Keil, Dresden, DE;

Wolfgang Buchholtz, Radebeul, DE;

Petra Hetzer, Dresden, DE;

Elvira Buchholtz, Radebeul, DE;

Assignee:

Advanced Micro Devices, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

By improving the purity of metal lines and the crystalline structure, the overall performance of metal lines, especially of highly scaled copper-based semiconductor devices, may be enhanced. The modification of the crystalline structure of the metal lines may be performed by a heat treatment generating locally restricted heating zones, which are scanned along the length direction of the metal lines, and/or a heat treatment comprising a heating step in a vacuum ambient followed by a heating step in a reducing ambient.


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