The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7375030 B1

PDF
Full Text
Expired
Date of Patent:
May. 20, 2008

Filed:

May. 25, 2006
Applicants:

Hok-kin Choi, San Jose, CA (US);

Robert P. Meagley, Hillsboro, OR (US);

Inventors:

Hok-Kin Choi, San Jose, CA (US);

Robert P. Meagley, Hillsboro, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract

Numerous embodiments of a method to assay sacrificial material are disclosed. In one embodiment, a sacrificial material may be analyzed by high performance liquid chromatography. Chemical markers that correlate with material contaminants in the sacrificial material may be identified.


Find Patent Forward Citations

Choi, Hok-Kin. (2008). Method to assay sacrificial light absorbing materials and spin on glass materials for chemical origin of defectivity (U.S. Patent No. 7375030). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7375030

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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