The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
Sep. 15, 2004
Bing Ji, Allentown, PA (US);
Martin Jay Plishka, Apache Junction, AZ (US);
Dingjun Wu, Macungie, PA (US);
Peter Richard Badowski, White Haven, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Bing Ji, Allentown, PA (US);
Martin Jay Plishka, Apache Junction, AZ (US);
Dingjun Wu, Macungie, PA (US);
Peter Richard Badowski, White Haven, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A process for the selective removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance from a substrate comprising: providing the substrate having the substance deposited thereupon wherein the substance comprises a transition metal ternary compound, a transition metal quaternary compound, and combinations thereof; reacting the substance with a process gas comprising a fluorine-containing gas and optionally an additive gas to form a volatile product; and removing the volatile product from the substrate to thereby remove the substance from the substrate.