The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
Jan. 28, 2005
Jeremy Isaac Martin, Annandale on Hudson, NY (US);
Jeremy Isaac Martin, Annandale on Hudson, NY (US);
Advanced Micro Devices, Austin, TX (US);
Abstract
A method and apparatus are provided for a graded PECVD process that continuously modulates a set of flow and pressure conditions while the plasma power is turned on and a film is being deposited. A feedback mechanism specific to a give deposition recipe is used to generate, optimize and maintain a dynamic profile for a first input process parameter that produces a desired dynamic profile for a first output process parameter. An iterative approach produces a gradually converging series of dynamic profiles of an input profile parameter, which eventually succeeds in producing the desired dynamic profile for the first output process parameter of the graded PECVD process.