The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
Sep. 09, 2004
Magnetic elements with spin engineered insertion layers and mram devices using the magnetic elements
Zhitao Diao, Fremont, CA (US);
Yiming Huai, Pleasanton, CA (US);
Thierry Valet, Sunnyvale, CA (US);
Paul P. Nguyen, San Jose, CA (US);
Mahendra Pakala, San Jose, CA (US);
Zhitao Diao, Fremont, CA (US);
Yiming Huai, Pleasanton, CA (US);
Thierry Valet, Sunnyvale, CA (US);
Paul P. Nguyen, San Jose, CA (US);
Mahendra Pakala, San Jose, CA (US);
Grandis, Inc., Milpitas, CA (US);
Abstract
A method and system include providing a pinned layer, a free layer, and a spacer layer between the pinned and free layers. The spacer layer is nonmagnetic. The magnetic element is configured to allow the free layer to be switched due to spin transfer when a write current is passed through the magnetic element. In one aspect, the method and system include providing a spin engineered layer adjacent to the free layer. The spin engineered layer is configured to more strongly scatter majority electrons than minority electrons. In another aspect, at least one of the pinned, free, and spacer layers is a spin engineered layer having an internal spin engineered layer configured to more strongly scatter majority electrons than minority electrons. In this aspect, the magnetic element may include another pinned layer and a barrier layer between the free and pinned layers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile