The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2008
Filed:
Aug. 24, 2006
Applicants:
Toshimitsu Hirai, Chino, JP;
Toshiaki Mikoshiba, Suwa, JP;
Inventors:
Toshimitsu Hirai, Chino, JP;
Toshiaki Mikoshiba, Suwa, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a predetermined pattern by disposing a functional liquid on a substrate, the method includes the steps of forming banks on the substrate, and disposing the functional liquid on a region divided by the banks, wherein a width of the region is partially formed so as to be large.
Hirai, Toshimitsu. (2008). Pattern forming method, device, method of manufacture thereof, electro-optical apparatus, and electronic apparatus (U.S. Patent No. 7365008). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7365008
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile