The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2008
Filed:
Nov. 22, 2006
Applicants:
Yoko Yamaguchi, Fremont, CA (US);
Chris Lee, Oakland, CA (US);
Inventors:
Yoko Yamaguchi, Fremont, CA (US);
Chris Lee, Oakland, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for etching a multi-layer resist defined over a substrate in a plasma etch chamber is provided. The method initiates with introducing the substrate having a pattern defined on a first layer of the multi-layer resist into the etch chamber. SOgas flows into the etch chamber and a plasma is struck in the etch chamber while flowing the SOgas. The multi-layer resist is then etched.