The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2008
Filed:
Nov. 12, 2003
Applicants:
Shian-jyh Lin, Chiayi, TW;
Chia-sheng Yu, Taipei, TW;
Wen-sung Tsou, Taipei, TW;
Inventors:
Assignee:
Nanya Technology Corporation, Taoyuan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8242 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a conductive stud is provided. The method includes providing a substrate which has an upper surface and an opening. The opening exposes a portion of a vertical memory device. A conductive layer is formed over the substrate to fill the opening. A chemical mechanical polishing is performed on the conductive layer to form a conductive stud having an upper surface substantially lower than the upper surface of the substrate.
Quick Actions:
Lin, Shian-Jyh. (2008). Method of forming conductive stud on vertical memory device (U.S. Patent No. 7361546). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7361546
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile