The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Mar. 17, 2006
Chang Yung Cheng, Tainan, TW;
Hsueh-shih Fu, Hsin-Chu, TW;
Ying-lang Wang, Tai-Chung County, TW;
Fan-tien Cheng, Tainan, TW;
Chang Yung Cheng, Tainan, TW;
Hsueh-Shih Fu, Hsin-Chu, TW;
Ying-Lang Wang, Tai-Chung County, TW;
Fan-Tien Cheng, Tainan, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
Provided are a method and a system for virtual metrology in semiconductor manufacturing. Process data and metrology data are received. Prediction data is generated based on the process data and metrology data using a learning control model. The system for virtual metrology in a fabrication facility comprises a fault detection and classification system operable to receive process data, a statistical process control system operable to perform statistical process control on a history of physical metrology data to form metrology data, and a virtual metrology application operable to generate prediction data based on the process data and the metrology data using a learning control model.