The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Dec. 24, 2003
Hideo Tsuchiya, Kawasaki, JP;
Yoshihide Kato, Tokyo, JP;
Kazuto Matsuki, Tokyo, JP;
Yasushi Sanada, Yokohama, JP;
Riki Ogawa, Yokohama, JP;
Takuro Nagao, Kawasaki, JP;
Hideo Tsuchiya, Kawasaki, JP;
Yoshihide Kato, Tokyo, JP;
Kazuto Matsuki, Tokyo, JP;
Yasushi Sanada, Yokohama, JP;
Riki Ogawa, Yokohama, JP;
Takuro Nagao, Kawasaki, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.