The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Aug. 25, 2004
Michel Pieter Dansberg, Eindhoven, NL;
Sebastiaan Maria Johannes Cornelissen, Eindhoven, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Robert Johannes Petrus Van Diesen, Oirschot, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Robert-han Munnig Schmidt, Hapert, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Rob Jansen, Veldhoven, NL;
Michel Pieter Dansberg, Eindhoven, NL;
Sebastiaan Maria Johannes Cornelissen, Eindhoven, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Robert Johannes Petrus Van Diesen, Oirschot, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Robert-Han Munnig Schmidt, Hapert, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Rob Jansen, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.