The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Mar. 11, 2004
Albert Jan Hendrik Klomp, Eindhoven, NL;
Jan Frederik Hoogkamp, Breda, NL;
Josephus Cornelius Johannes Antonius Vugts, Waalwijk, NL;
Robert Gordon Livesey, Haywards Heath, GB;
Johannes Hendrikus Gertrudis Franssen, Eersel, NL;
Albert Jan Hendrik Klomp, Eindhoven, NL;
Jan Frederik Hoogkamp, Breda, NL;
Josephus Cornelius Johannes Antonius Vugts, Waalwijk, NL;
Robert Gordon Livesey, Haywards Heath, GB;
Johannes Hendrikus Gertrudis Franssen, Eersel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Lithographic projection assembly, including at least one load lock for transferring objects, in particular substrates, between a first environment and a second environment, the second environment preferably having a lower pressure than the first environment; an object handler including a handler chamber in which the second environment prevails; and a lithographic projection apparatus including a projection chamber. The handler chamber and projection chamber can communicate for transferring the objects. The load lock includes a load lock chamber; evacuation device for evacuating the load lock chamber; and door device for closing the load lock chamber during evacuation and for opening the load lock chamber to enter an object in or remove an object from the load lock chamber. The load lock chamber may be provided with at least two mutually distinct object support positions.