The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
Mar. 24, 2005
Applicants:
Doo-won Kwon, Seoul, KR;
Hyung-ho Ko, Seoul, KR;
Chang-sup Mun, Incheon-si, KR;
Woo-gwan Shim, Yongin-si, KR;
Im-soo Park, Seoul, KR;
Yu-kyung Kim, Busan-si, KR;
Jeong-nam Han, Seoul, KR;
Inventors:
Doo-Won Kwon, Seoul, KR;
Hyung-Ho Ko, Seoul, KR;
Chang-Sup Mun, Incheon-si, KR;
Woo-Gwan Shim, Yongin-si, KR;
Im-Soo Park, Seoul, KR;
Yu-Kyung Kim, Busan-si, KR;
Jeong-Nam Han, Seoul, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/461 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
This invention provides methods of fabricating semiconductor devices, wherein an alloy layer is formed on a semiconductor substrate to form a substrate structure, which methods include using an aqueous solution diluted ammonia and peroxide mixture (APM) to perform cleaning and/or wet etching treatment steps on the substrate structure.