The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7354482 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 08, 2008

Filed:

Sep. 30, 2004
Applicants:

Yoshiyuki Konishi, Hadano, JP;

Katsutoyo Osanai, Kanagawa-ken, JP;

Inventors:

Yoshiyuki Konishi, Hadano, JP;

Katsutoyo Osanai, Kanagawa-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/00 (2006.01); C23C 14/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A film deposition device for depositing a film includes a depositing chamber for depositing the film with plasma. A plasma quantity monitoring device is disposed in the depositing chamber for monitoring a plasma quantity entering the depositing chamber at real time. A calculating device is electrically connected to the plasma quantity monitoring device for calculating a thickness of the film from the plasma quantity so that the thickness is monitored at real time.

Published as:
US2005081790A1; JP2005139547A; US7354482B2; JP4274017B2;

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Konishi, Yoshiyuki. (2008). Film deposition device (U.S. Patent No. 7354482). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7354482

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