The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2008
Filed:
Jun. 20, 2005
Hans Butler, Best, NL;
Evert Hendrik Jan Draaijer, Eindhoven, NL;
Marcus Joseph Elisabeth Godfried Breukers, Eindhoven, NL;
Hans Butler, Best, NL;
Evert Hendrik Jan Draaijer, Eindhoven, NL;
Marcus Joseph Elisabeth Godfried Breukers, Eindhoven, NL;
ASML Netherlands, B.V., Veldhoven, NL;
Abstract
A control system to control a position of a substrate table for a lithographic apparatus, including: a first detection device to generate a position signal representative of the position of the projection system, a second detection device to generate a projection system feed-forward signal, a comparative unit to generate a servo error signal by subtracting a signal representative of an actual substrate table position from a substrate table position reference signal and adding the projection system position signal, a control unit to generate a first control signal on the basis of the servo error signal, an addition unit to generate a second control signal by adding the feed-forward signal and the first control signal, and an actuator unit to actuate the substrate table to a desired substrate table position on the basis of the second control signal. The control system further includes a projection system position signal filter unit.