The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7351971 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 01, 2008

Filed:

Jun. 30, 2006
Applicants:

Yukihiro Tanaka, Saitama, JP;

Manabu Saito, Tokyo, JP;

Inventors:

Yukihiro Tanaka, Saitama, JP;

Manabu Saito, Tokyo, JP;

Assignee:

Jeol Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); G21K 7/00 (2006.01); G01N 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A charged-particle beam instrument and method are offered which can inspect side and rear surfaces of the outer periphery of a specimen. The instrument has a source of the charged-particle beam and an objective lens for focusing the beam onto the specimen positioned inside a specimen chamber. The instrument further includes an electrostatic electrode and a deflection voltage power supply for applying a deflection voltage to the electrostatic electrode located on a downstream side of the objective lens. The electrostatic electrode reflects or deflects the beam passed through the objective lens such that the beam is directed at the specimen.


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Tanaka, Yukihiro. (2008). Charged-particle beam instrument and method of detection (U.S. Patent No. 7351971). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7351971

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