The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2008
Filed:
Oct. 19, 2004
Vladimir Ivanovich Kuznetsov, Delft, NL;
Sijbrand Radelaar, Bilthoven, NL;
Jacobus Cornells Gerardus Van Der Sanden, Geldrop, NL;
Theo Anjes Maria Ruijl, Bocholtz, NL;
Vladimir Ivanovich Kuznetsov, Delft, NL;
Sijbrand Radelaar, Bilthoven, NL;
Jacobus Cornells Gerardus Van Der Sanden, Geldrop, NL;
Theo Anjes Maria Ruijl, Bocholtz, NL;
ASM International N.V., , NL;
Abstract
Method and device for rotating a wafer which is arranged floating in a reactor. The wafer is treated in a reactor of this nature, and it is important for this treatment to be carried out as uniformly as possible. For this purpose, it is proposed to rotate the wafer by allowing the gas flow to emerge perpendicular to the surface of the wafer and then to impart to this gas a component which is tangential with respect to the wafer, thus generating rotation. This tangential component may be generated by the provision of grooves, which may be of spiral or circular design.