The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
Feb. 06, 2004
John L. Sturtevant, Beaverton, OR (US);
Yiming Gu, Hillsboro, OR (US);
John L. Sturtevant, Beaverton, OR (US);
Yiming Gu, Hillsboro, OR (US);
Integrated Device Technology, inc., San Jose, CA (US);
Abstract
Methods for determining tolerances are disclosed that can be used for determining whether a lot of semiconductor wafers needs to be reworked. Overlay tolerance, critical dimension tolerance and a dynamic line edge placement tolerance are determined using error measurements that are taken from sample wafers in the lot, giving tolerances that reflect the error state of that particular lot of semiconductor wafers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile