The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Mar. 23, 2004
Hiroki Yoshikawa, Niigata, JP;
Yukio Inazuki, Niigata, JP;
Noriyasu Fukushima, Niigata, JP;
Hideo Kaneko, Niigata, JP;
Satoshi Okazaki, Niigata, JP;
Hiroki Yoshikawa, Niigata, JP;
Yukio Inazuki, Niigata, JP;
Noriyasu Fukushima, Niigata, JP;
Hideo Kaneko, Niigata, JP;
Satoshi Okazaki, Niigata, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
There is disclosed a method of producing a phase shift mask blank wherein the method includes at least a step of forming one or more layers of phase shift films on a substrate by a sputtering method, and in the step, the phase shift films are formed by the sputtering method while simultaneously discharging plural targets having different compositions. Thereby, a phase shift mask blank having a desired composition and quality, in particular, having a phase shift film with few defects can be easily produced.