The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Dec. 18, 2003
Hiroshi Kumano, Kyoto, JP;
Yuichi Mikata, Ibaraki, JP;
Hiroshi Kumano, Kyoto, JP;
Yuichi Mikata, Ibaraki, JP;
Rohm Co., Ltd., Kyoto, JP;
Toshiba Corporation, Tokyo, JP;
Abstract
A mask is provided wherein the mask has: a plate-like member having a mask pattern area and at least one pn junction; and a current supplying area which supplies a current to the pn junction, and a Peltier effect is caused by supplying a current to the pn junction, thereby enabling the temperature of the mask pattern area to be controlled. When this mask is used, reliable formation of an ion implanted region is enabled without forming a resist pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile