The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Dec. 27, 2002
Hiroichi Inada, Koshi-Machi, JP;
Naofumi Kishita, Koshi-Machi, JP;
Hiroichi Inada, Koshi-Machi, JP;
Naofumi Kishita, Koshi-Machi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Dislocation of processing liquid pouring nozzles is prevented, smooth carrying of the processing liquid pouring nozzles is achieved, and the positional accuracy of the processing liquid pouring nozzles, processing accuracy and yield are improved. A substrate processing apparatus includes a spin chuck () for holding and rotating a wafer (W), a plurality of processing liquid pouring nozzles () for pouring processing liquids on a surface of the wafer (W), a solvent bath () for holding the processing liquid pouring nozzles at their home positions, and a nozzle-carrying arm () for detachably gripping desired one of the processing liquid pouring nozzles () held on the solvent bath () and carrying the desired processing liquid pouring nozzle () to a working position above the wafer (W). The processing liquid pouring nozzles () are held in alignment with straight lines (L) extending between the center (C) of the spin chuck () about which the spin chuck () rotates and nozzle holding openings () formed at suitable intervals in the solvent bath (), respectively, and flexible supply tubes () connecting the processing liquid pouring nozzles () to processing liquid sources are arranged on extensions of the straight lines (L) respectively.