The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
Dec. 21, 2004
Applicants:
Nobuo Shimizu, Suwa, JP;
Hideto Yamashita, Suwa, JP;
Makoto Ishii, Suwa, JP;
Inventors:
Assignee:
Seiko Epson Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 21/56 (2006.01); G03B 21/60 (2006.01); G02B 7/00 (2006.01); B29D 11/00 (2006.01); B44C 1/22 (2006.01); H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An etching method is disclosed. The etching method includes the steps of: preparing a substrateforming first and second filmseach having predetermined internal stress on the substrate so that the internal stresses of the first and second filmsare canceled out or reduced with each other; forming a plurality of initial holesin the first and second filmsto form a maskand forming a plurality of concave portionsin the substrateat portions corresponding to the plurality of initial holesby subjecting the substrateto an etching process using the mask