Makoto Ishii

Title: The Innovative Contributions of Makoto Ishii

Introduction

Makoto Ishii is a notable inventor based in Suwa, Japan. He has made significant contributions to the field of etching methods, particularly in the development of substrates with concave portions. His work has implications for various applications, including microlens substrates and rear projection screens.

Latest Patents

Ishii holds a patent for an etching method that involves preparing a substrate and forming first and second films with predetermined internal stress. This innovative method allows for the cancellation or reduction of internal stresses between the films. The process includes creating initial holes in the films to form a mask, which is then used to etch concave portions in the substrate. This patent showcases his expertise in material science and engineering.

Career Highlights

Makoto Ishii is associated with Seiko Epson Corporation, a leading company in imaging and printing technology. His work at Epson has allowed him to explore advanced technologies and contribute to the company's innovative projects. His patent reflects his commitment to enhancing the capabilities of optical devices.

Collaborations

Ishii has collaborated with notable colleagues, including Nobuo Shimizu and Hideto Yamashita. These collaborations have likely enriched his research and development efforts, fostering a creative environment for innovation.

Conclusion

Makoto Ishii's contributions to the field of etching methods and his patent for innovative substrate technology highlight his role as a significant inventor in the industry. His work continues to influence advancements in optical technologies.