The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2008

Filed:

Dec. 17, 2002
Applicants:

Hiroyuki Mano, Tokyo, JP;

Hiroomi Shimomura, Tokyo, JP;

Akira Nishikawa, Tokyo, JP;

Inventors:

Hiroyuki Mano, Tokyo, JP;

Hiroomi Shimomura, Tokyo, JP;

Akira Nishikawa, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An ethylenically unsaturated group-containing fluoropolymer, which is obtained by reacting a compound containing one isocyanate group and at least one ethylenically unsaturated group, and a hydroxyl group-containing fluoropolymer at an isocyanate group/hydroxyl group molar ratio of 1.1 to 1.9. According to the present invention, an ethylenically unsaturated group-containing fluoropolymer having superior antiscratching property, coating property and durability, as well as a curable resin composition and an antireflection film using the same can be provided.


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