The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2008
Filed:
Aug. 19, 2005
Satoshi Matsuda, Oita-ken, JP;
Satoshi Matsuda, Oita-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to an aspect of the present invention, there is provided a pattern design method of a semiconductor device, including preparing design pattern data, separating a pattern region of a semiconductor device on the basis of the design pattern data into a dummy pattern region and a dummy pattern prohibition region, dividing the dummy pattern region into dummy pattern unit regions, setting a plurality of inspection areas in the dummy pattern region and the dummy pattern prohibition region, the inspection area closing round at least the two or more dummy pattern unit regions, a part of the one dummy pattern unit region overlapping a part of another dummy pattern unit region, calculating a tentative pattern-covering fraction of a dummy pattern, the dummy pattern being formed of the dummy pattern unit region in the inspection area, calculating a final pattern-covering fraction of the dummy pattern unit region, the final pattern-covering fraction being obtained by averaging the tentative pattern-covering fraction of the dummy pattern unit region in the inspection area, and generating the dummy pattern in the dummy pattern unit region on the basis of the final pattern-covering fraction calculated on the dummy pattern unit region.