The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2008

Filed:

May. 08, 2003
Applicant:

Artur G. Olszak, Tucson, AZ (US);

Inventor:

Artur G. Olszak, Tucson, AZ (US);

Assignee:

Ometrix, Inc., Tucson, AZ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The sample stage of an array microscope is tilted in the scanning direction such that the best-focus plane of the array microscope intersects the surface of the sample during the scan. As a result of the tilt, the distance from the sample surface of each miniaturized microscope spanning the array varies from point to point on the surface. Accordingly, the best focal distance for each such point on the sample surface is identified by tracking the quality of its focus as the sample surface travels across the rows of microscopes in the array. Best focus may be detected using any known technique, such as by measuring spatial frequency content and recording the scan position corresponding to maximum mid-range frequency content. This information is used to develop a best-focus axial-position map for use while performing a subsequent measurement scan.


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