The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
May. 20, 2004
Yusuke Nakagawa, Kawasaki, JP;
Shinichi Hidesaka, Kawasaki, JP;
Kenji Maruyama, Kawasaki, JP;
Satoshi Shimatani, Kawasaki, JP;
Masahiro Masujima, Kawaski, JP;
Kazuyuki Nitta, Kawasaki, JP;
Yusuke Nakagawa, Kawasaki, JP;
Shinichi Hidesaka, Kawasaki, JP;
Kenji Maruyama, Kawasaki, JP;
Satoshi Shimatani, Kawasaki, JP;
Masahiro Masujima, Kawaski, JP;
Kazuyuki Nitta, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an undulation phenomenon, and a method for formation of a resist pattern, a chemical amplification type positive photoresist composition comprising (A) an alkali soluble resin comprising a hydroxystyrene constituent unit (a1) and a styrene constituent unit (a2), (B) a crosslinking agent, (C) a photo acid generator, and an organic solvent is prepared and a resist pattern is formed by using the same.