The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
Sep. 15, 2006
Applicants:
Yukio Hosaka, Tokyo, JP;
Hiroyuki Tano, Tokyo, JP;
Hideki Nishimura, Tokyo, JP;
Hiroshi Shiho, Tokyo, JP;
Inventors:
Yukio Hosaka, Tokyo, JP;
Hiroyuki Tano, Tokyo, JP;
Hideki Nishimura, Tokyo, JP;
Hiroshi Shiho, Tokyo, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to a method of manufacturing a chemical mechanical polishing pad which provides a chemical mechanical polishing pad which fully suppresses the occurrence of a scratch on the polished surface and has an excellent polishing rate. The method comprising either one of a group of steps (A) and a group of steps (B), the group of steps (A) including