The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
Mar. 02, 2006
Koichi Ono, Ohtsu, JP;
Tetsuo Shimomura, Ohtsu, JP;
Masahiko Nakamori, Ohtsu, JP;
Takatoshi Yamada, Ohtsu, JP;
Shigeru Komai, Ohtsu, JP;
Masayuki Tsutsumi, Ohtsu, JP;
Koichi Ono, Ohtsu, JP;
Tetsuo Shimomura, Ohtsu, JP;
Masahiko Nakamori, Ohtsu, JP;
Takatoshi Yamada, Ohtsu, JP;
Shigeru Komai, Ohtsu, JP;
Masayuki Tsutsumi, Ohtsu, JP;
Toyo Tire & Rubber Co., Ltd., Osaka, JP;
Abstract
A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.