The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Mar. 09, 2005
Sandeep Mehta, Beverly, MA (US);
Steven R. Walther, Andover, MA (US);
Naushad K. Variam, Marblehead, MA (US);
Sandeep Mehta, Beverly, MA (US);
Steven R. Walther, Andover, MA (US);
Naushad K. Variam, Marblehead, MA (US);
Verian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
Plasma ion implantation apparatus includes a process chamber, a platen located in the process chamber for supporting a substrate, a dopant source including a solid dopant element and a vaporizer to vaporize dopant material from the solid dopant element, a plasma source to produce a plasma containing ions of the dopant material, and an implant pulse source to apply implant pulses to the platen for accelerating the ions of the dopant material from the plasma into the substrate.