The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Jul. 14, 2005
Applicants:
Katherina E. Babich, Chappaqua, NY (US);
Sean D. Burns, Hopewell Junction, NY (US);
Elbert E. Huang, Tarrytown, NY (US);
Arpan P. Mahorowala, Bronxville, NY (US);
Dirk Pfeiffer, Dobbs Ferry, NY (US);
Karen Temple, Toronto, CA;
Inventors:
Katherina E. Babich, Chappaqua, NY (US);
Sean D. Burns, Hopewell Junction, NY (US);
Elbert E. Huang, Tarrytown, NY (US);
Arpan P. Mahorowala, Bronxville, NY (US);
Dirk Pfeiffer, Dobbs Ferry, NY (US);
Karen Temple, Toronto, CA;
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B32B 9/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer of formula I,