The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2008

Filed:

Nov. 04, 2003
Applicants:

Kunihiko Sakurai, San Jose, CA (US);

Gerard Moloney, Milpitas, CA (US);

Huey-ming Wang, Fremont, CA (US);

Jun Liu, Cupertino, CA (US);

Peter Lao, San Jose, CA (US);

Inventors:

Kunihiko Sakurai, San Jose, CA (US);

Gerard Moloney, Milpitas, CA (US);

Huey-Ming Wang, Fremont, CA (US);

Jun Liu, Cupertino, CA (US);

Peter Lao, San Jose, CA (US);

Assignee:

Ebara Technologies Incorporated, Sacramento, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a vertically adjustable chemical mechanical polishing head having a pivot mechanism and method for use thereof.


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