The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Oct. 18, 2002
Applicants:
Naohisa Goto, Hachioji-shi, Tokyo, JP;
Tadahiro Ohmi, Sendai-shi, Miyagi, JP;
Masaki Hirayama, Sendai, JP;
Tetsuya Goto, Sendai, JP;
Inventors:
Naohisa Goto, Hachioji-shi, Tokyo, JP;
Tadahiro Ohmi, Sendai-shi, Miyagi, JP;
Masaki Hirayama, Sendai, JP;
Tetsuya Goto, Sendai, JP;
Assignees:
Other;
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract
A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.