The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2008
Filed:
Sep. 21, 2006
Peter DE Groot, Middletown, CT (US);
Michael J Darwin, Beaverton, OR (US);
Robert T Stoner, Duxbury, MA (US);
Gregg M. Gallatin, Newtown, CT (US);
Xavier Colonna DE Lega, Middletown, CT (US);
Peter De Groot, Middletown, CT (US);
Michael J Darwin, Beaverton, OR (US);
Robert T Stoner, Duxbury, MA (US);
Gregg M. Gallatin, Newtown, CT (US);
Xavier Colonna De Lega, Middletown, CT (US);
Zygo Corporation, Middlefield, CT (US);
Abstract
Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parameterized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.