The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2008

Filed:

Sep. 09, 2003
Applicants:

Kuo-tung Chang, Saratoga, CA (US);

Yu Sun, Saratoga, CA (US);

Inventors:

Kuo-Tung Chang, Saratoga, CA (US);

Yu Sun, Saratoga, CA (US);

Assignee:

Spansion LLC, Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for coupling to a common line in an array. Gate structures of an integrated circuit are formed. Source and drain regions adjacent to the gate structures are implanted. A source contact from a metal Vss line to a source region is formed. Dopants of the source and drain regions diffuse laterally to overlap. The overlapping diffusion regions conduct and couple the drain region to a source region. Beneficially, the drain region is coupled to the metal Vss line. As a beneficial result, source contacts may be formed along a line of drain contacts in associated rows of drain contacts, and coupled to a common source line via the novel overlapping diffusion regions. A plurality of word lines may be formed without any bending in the word lines to accommodate source contacts that are larger than the source line. Numerous deleterious consequences of bent word lines, for example decreased array density and detrimental electrical behavior of memory cells in the vicinity of bent word lines, may beneficially be overcome by embodiments of the present invention.


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