The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2008
Filed:
Mar. 29, 2005
Tim Weyrich, Zurich, CH;
Wojciech Matusik, Cambridge, MA (US);
Hanspeter Pfister, Arlington, MA (US);
Henrik Wann Jensen, Santa Monica, CA (US);
Wai Kit Addy Ngan, Cambridge, MA (US);
Markus Gross, Uster, CH;
Tim Weyrich, Zurich, CH;
Wojciech Matusik, Cambridge, MA (US);
Hanspeter Pfister, Arlington, MA (US);
Henrik Wann Jensen, Santa Monica, CA (US);
Wai Kit Addy Ngan, Cambridge, MA (US);
Markus Gross, Uster, CH;
Mitsubishi Electric Research Laboratories, Inc., Cambridge, MA (US);
Abstract
A face is scanned to obtain a three-dimensional geometry of the face, images are also acquired of the face, and subsurface scattering of the face is measured. A translucency map is determined from the subsurface reflectance. A total surface reflectance and a normal map are estimated from the three-dimensional geometry and the images, and diffuse reflectance is estimated using the total reflectance. An albedo map is determined from the diffuse reflectance. The diffuse reflectance is subtracted from the total reflectance to obtain a surface reflectance. A set of bi-directional reflectance functions is fitted to the surface reflectance. Then, the set of bi-directional reflectance distribution functions, the albedo map, and the translucency map are combined to form a skin reflectance model of the face.