The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7315373 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 01, 2008

Filed:

Nov. 13, 2002
Applicants:

Yoshiki Fukuzaki, Hiroshima, JP;

Tomoyuki Shitaku, Hiroshima, JP;

Inventors:

Yoshiki Fukuzaki, Hiroshima, JP;

Tomoyuki Shitaku, Hiroshima, JP;

Assignee:

Rorze Corporation, Hiroshima, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In wafer positioning by moving a center point () of a wafer () to a given position and orienting a notch part () of the wafer in a given direction, wafer seat drive means (, or) positions a rotation axis (B) of a wafer seat () on a straight line which passes through a center part of a line sensor () and extends in the extending direction thereof, and rotates the wafer seat on which the wafer lies around the rotation axis; calculation means () finds a wafer notch part position and a maximum or minimum eccentric radius of the wafer based on a rotation angle of the wafer seat and detection results of an outer periphery edge of the wafer lying on the wafer seat by the line sensor, and, from the obtained results, geometrically calculates a rotation axis position and a rotation angle of the wafer when the wafer center point is at the given position and the wafer notch part is oriented in the given direction; and the wafer seat drive means (, or) moves, rotates, and stops the wafer seat () so that a rotation axis position and a rotation angle of the wafer seat correspond to the calculated rotation axis position and the calculated rotation angle. In result, speed and precision in a wafer positioning operation can be thereby improved.


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Fukuzaki, Yoshiki. (2008). Wafer positioning method and device, wafer process system, and wafer seat rotation axis positioning method for wafer positioning device (U.S. Patent No. 7315373). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7315373

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