The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2008
Filed:
Dec. 12, 2003
Michael Cornelis Van Beek, Eindhoven, NL;
Levinus Pieter Bakker, Helmond, NL;
Theodorus Hubertus Josephus Bisschops, Eindhoven, NL;
Jeroen Jonkers, Aachen, DE;
Mark Kroon, Utrecht, NL;
Robertus Adrianus Maria Wolters, Eindhoven, NL;
Adrianus Johannes Henricus Maas, Eindhoven, NL;
Michael Cornelis Van Beek, Eindhoven, NL;
Levinus Pieter Bakker, Helmond, NL;
Theodorus Hubertus Josephus Bisschops, Eindhoven, NL;
Jeroen Jonkers, Aachen, DE;
Mark Kroon, Utrecht, NL;
Robertus Adrianus Maria Wolters, Eindhoven, NL;
Adrianus Johannes Henricus Maas, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.