The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2008
Filed:
Sep. 30, 2005
Dieter Winkler, Munich, DE;
Henry Pearce-percy, Los Gatos, CA (US);
Juergen Frosien, Reimerling, DE;
William J. Devore, Hayward, CA (US);
Dieter Winkler, Munich, DE;
Henry Pearce-Percy, Los Gatos, CA (US);
Juergen Frosien, Reimerling, DE;
William J. Devore, Hayward, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.