The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2008

Filed:

Apr. 20, 2005
Applicants:

Ryuichi Nakano, Shisui-machi, JP;

Yukihiro Hyobu, Tokyo, JP;

Yoshihisa Okamoto, Tokyo, JP;

Inventors:

Ryuichi Nakano, Shisui-machi, JP;

Yukihiro Hyobu, Tokyo, JP;

Yoshihisa Okamoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65B 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

While gas in a general storage container with no gas inlet and in the storage container with the gas inlet is replaced in a short time, the semiconductor wafer surface is cleaned. In an apparatus for replacing gas in a semiconductor wafer storage container which includes a lid unit and a storage container main body with a gas inlet, the apparatus includes gas introducing means for introducing the gas into the storage container main body, gas evacuating means for evacuating the gas in the storage container main body, and gas circulating means for circulating the gas in the storage container main body through a chemical adsorption filter. Gas introducing means for introducing the gas from a gap between the storage container main body and the lid unit while the lid unit is opened in the storage container mounting means is provided in the storage container with no gas inlet.


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