The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2008
Filed:
Mar. 31, 2004
Richard Hsiao, San Jose, CA (US);
Prakash Kasiraj, San Jose, CA (US);
Quang Le, San Jose, CA (US);
Paul Phong Nguyen, San Jose, CA (US);
Son Van Nguyen, Los Gatos, CA (US);
Denny D. Tang, Saratoga, CA (US);
Patrick Rush Webb, San Jose, CA (US);
Richard Hsiao, San Jose, CA (US);
Prakash Kasiraj, San Jose, CA (US);
Quang Le, San Jose, CA (US);
Paul Phong Nguyen, San Jose, CA (US);
Son Van Nguyen, Los Gatos, CA (US);
Denny D. Tang, Saratoga, CA (US);
Patrick Rush Webb, San Jose, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A Damascene process is provided for manufacturing a coil structure for a magnetic head. During the manufacturing process, an insulating layer is initially deposited after which a photoresist layer is deposited. A silicon dielectric layer is then deposited on the photoresist layer. After masking the silicon dielectric layer, at least one channel is etched in the photoresist layer and the silicon dielectric layer. Then, a conductive seed layer is deposited in the at least one channel. The at least one channel is then ready to be filled with a conductive material and chemically/mechanically polished to define a coil structure.