The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2007
Filed:
Oct. 05, 2004
Emiel Jozef Melanie Eussen, Margraten, NL;
Tjarko Adriaan Rudolf Van-empel, Eindhoven, NL;
Wouter Onno Pril, Eindhoven, NL;
Emiel Jozef Melanie Eussen, Margraten, NL;
Tjarko Adriaan Rudolf Van-Empel, Eindhoven, NL;
Wouter Onno Pril, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a lithographic apparatus, a measurement of the position of an object in an ambient space by an object position measuring system which is influenced by pressure variations in the ambient space, is corrected by an accurate measurement of the pressure in the ambient space. A pressure difference is measured between a pressure in a reference pressure volume and an ambient pressure in an ambient space. An absolute pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space. Alternatively, the pressure difference is integrated over time and a determined change of pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space.