The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2007
Filed:
Apr. 25, 2006
Applicants:
Matthias Schaller, Dresden, DE;
Massud Aminpur, Crolles, FR;
James Werking, Dresden, DE;
Inventors:
Assignee:
Advanced Micro Devices, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
By performing a first common etch process for forming a via opening and a delineation trench or open area in a metallization layer with different removal rates, the etch front in the delineation trench or open area may be delayed, thereby significantly reducing the probability of wafer arcing. Subsequently, the delineation trench or open area may be etched down to the respective etch stop layer in a further common etch process, during which a trench is formed above the via opening.