The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2007
Filed:
Nov. 03, 2003
Dirk Basting, Fort Lauderdale, FL (US);
Sergei Govorkov, Boca Raton, FL (US);
Rainer Paetzel, Dransfeld, DE;
Igor Bragin, Goettingen, DE;
Andreas Targsdorf, Gardelegen, DE;
Dirk Basting, Fort Lauderdale, FL (US);
Sergei Govorkov, Boca Raton, FL (US);
Rainer Paetzel, Dransfeld, DE;
Igor Bragin, Goettingen, DE;
Andreas Targsdorf, Gardelegen, DE;
Lambda Physik AG, Goettingen, DE;
Abstract
A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.