The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2007
Filed:
Mar. 20, 2006
Johannes Anna Quaedackers, Veldhoven, NL;
Koen Van Ingen Schenau, Veldhoven, NL;
Patrick Wong, Deurne, BE;
Michel Franciscus Johannes Van Rooy, Bladel, NL;
Johannes Anna Quaedackers, Veldhoven, NL;
Koen Van Ingen Schenau, Veldhoven, NL;
Patrick Wong, Deurne, BE;
Michel Franciscus Johannes Van Rooy, Bladel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only in the photoirradiated region, so that the film formed has a pattern corresponding to the pattern of the radiation.