The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2007
Filed:
Sep. 27, 2005
Jui-pin Chang, Hsinchu, TW;
Chien-hung Liu, Hsinchu, TW;
Ying-tso Chen, Hsinchu, TW;
Shou-wei Huang, Hsinchu, TW;
Jui-Pin Chang, Hsinchu, TW;
Chien-Hung Liu, Hsinchu, TW;
Ying-Tso Chen, Hsinchu, TW;
Shou-Wei Huang, Hsinchu, TW;
Macronix International Co., Ltd., Hsinchu, TW;
Abstract
A method of forming a conductive line suitable for decreasing a sheet resistance of the conductive lines. The method comprises steps of providing a material layer having a conductive layer formed thereon and forming a patterned mask layer on the conductive layer. In addition, a portion of the conductive layer is removed by using the patterned mask layer as a mask and a spacer is formed on a sidewall of the patterned mask layer and the conductive layer. A portion of the conductive layer is removed until the material layer is exposed to form a conductive line, wherein the spacer and the patterned mask layer serve as a mask.