The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2007
Filed:
Sep. 30, 2003
Applicant:
Ronald John Kuse, Fujimi, JP;
Inventor:
Ronald John Kuse, Fujimi, JP;
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 21/44 (2006.01); H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
Abstract
A variable temperature and/or reactant dose atomic layer deposition (VTD-ALD) process modulates ALD reactor conditions (e.g., temperature, flow rates, etc.) during growth of a film (e.g., metallic) on a wafer to produce different film properties a different film depths.
Quick Actions:
Kuse, Ronald. (2007). Variable temperature and dose atomic layer deposition (U.S. Patent No. 7306956). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7306956
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile