The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2007
Filed:
Sep. 22, 2004
Applicant:
Michael Kishinevsky, North Andover, MA (US);
Inventor:
Michael Kishinevsky, North Andover, MA (US);
Assignee:
MKS Instruments, Inc., Wilmington, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 41/16 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up, uses a feedforward type of control loop to tightly regulate the power supplied to the dynamic electrical load, such as loads caused by variable and inconsistent plasma impedance. A feedback control loop can also be used in combination with the feedforward loop, but at a slower rate, to help regulate the amount of power provided to the load.